N. E. Lobanova, V. V. Karzanov, D. I. Tetelbaum, “On the anomalous dose dependence of <nobr>$VV$</nobr>-center concentration in silicon under nitrogen ion implantation”, Fizika i Tekhnika Poluprovodnikov, 1992, Volume 26, Issue 8,Pages <nobr>1514

JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 1992 Volume 26, Issue 8, Pages 1514–1516 (Mi phts4780)

Short Notes

On the anomalous dose dependence of $VV$-center concentration in silicon under nitrogen ion implantation

N. E. Lobanova, V. V. Karzanov, D. I. Tetelbaum

Received: 11.07.1991
Accepted: 04.03.1992

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