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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2021 Volume 55, Issue 11, Pages 1077–1080 (Mi phts4944)

Micro- and nanocrystalline, porous, composite semiconductors

Influence of rapid thermal annealing on the distribution of nitrogen atoms in GaAsN/GaAs

A. Lazarenkoa, K. Yu. Shubinaa, E. V. Nikitinaab, E. V. Pirogova, A. M. Mizerova, M. S. Soboleva

a Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
b Ioffe Institute, St. Petersburg

Abstract: The article investigates the effect of rapid thermal annealing of ternary GaAs$_{1-x}$N$_x$/GaAs solid solutions on the distribution of nitrogen atoms in the crystal lattice. The samples are studied by photoluminescence spectroscopy and high-resolution X-ray diffractometry. Due to the size and electronegativity mismatch of nitrogen and arsenic atoms, nitrogen is incorporated unevenly into the GaAs crystal lattice. Options of the nitrogen atoms arrangement in the GaAs crystal lattice before and after rapid thermal annealing are shown.

Keywords: dilute nitrides, heterostructures, molecular-beam epitaxy, GaAs, nitrogen.

Received: 08.06.2021
Revised: 21.06.2021
Accepted: 21.06.2021

DOI: 10.21883/FTP.2021.11.51563.9697



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