Abstract:
In this work, we studied textured ZnO films obtained by ion-beam deposition. X-ray diffraction patterns and micrographs of the surface revealed that asdeposited films have a polycrystalline structure. It was found that, after annealing of the samples in the temperature range from
200$^{\circ}$C to 500$^{\circ}$, recrystallization occurs, leading to a change in the grain size and surface roughness. The dependence of the initial state of the film on the recrystallization intensity is also demonstrated. In films with an initially more perfect structure, temperature treatment at 500$^{\circ}$C led to grain growth by more than 2 times and a decrease in roughness by $\sim$ 40%.
Keywords:zinc oxide, thin films, crystallographic texture, annealing, film deposition by ion-beam sputtering, atomic force microscopy, X-ray diffractometry.