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Fizika i Tekhnika Poluprovodnikov, 2021 Volume 55, Issue 3, Pages 256–263 (Mi phts5067)

This article is cited in 4 papers

Semiconductor physics

Effect of the active region and waveguide design on the performance of edge-emitting lasers based on InGaAs/GaAs quantum well-dots

Yu. M. Shernyakovab, N. Yu. Gordeeva, A. S. Payusova, A. A. Serina, G. O. Kornyshovb, A. M. Nadtochiyc, M. M. Kulaginaa, S. A. Mintairovab, N. A. Kalyuzhnyyab, M. V. Maksimovb, A. E. Zhukovc

a Ioffe Institute, St. Petersburg, Russia
b Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg, Russia
c National Research University "Higher School of Economics", St. Petersburg Branch, St. Petersburg, Russia

Abstract: We study edge-emitting lasers with the active area based on novel InGaAs/GaAs quantum heterostructures of transitional dimensionality referred to as quantum well-dots, which are intermediate in properties between quantum wells and quantum dots. We show that the rate of the lasing wavelength blue-shift occurring with the reduction in cavity length decreases with an increase in the number of quantum well-dot layers in the active region and the optical confinement factor. In the laser based on 10 quantum well-dot layers, the position of the lasing wavelength remains in the optical region corresponding to the emission from the ground state down to the cavity lengths as short as 100 $\mu$m. In the devices based on a single quantum well-dot layer and/or with low optical confinement factor, lasing directly switches from the ground state to the GaAs waveguide states omitting excited state lasing with decrease in cavity length below 200 $\mu$m. Such an effect has not been observed in quantum well and quantum dot lasers and is attributed to the abnormally low density of excited states in quantum well-dots.

Keywords: quantum well-dots, semiconductor lasers, waveguide design, stripe lasers.

Received: 30.10.2020
Revised: 01.11.2020
Accepted: 01.11.2020

DOI: 10.21883/FTP.2021.03.50604.9547


 English version:
Semiconductors, 2021, 55:3, 333–340

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