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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2021 Volume 55, Issue 3, Pages 286–288 (Mi phts5071)

This article is cited in 1 paper

Manufacturing, processing, testing of materials and structures

Electrodeposition of metals on $p$-Si from aqueous electrolytes

V. N. Goriaeva, R. A. Bisengaliev

Kalmyk State University named after B. B. Gorodovikov, Elista, Russia

Abstract: The features of the electrochemical deposition of metal coatings on $p$-Si are presented, and the properties of the grown metal layers are measured. The dependence of the depleted-region thickness and the internal voltage drop in it on the electrolyte composition and deposited metal type is studied. The effect of the current density and electrolyte composition on the precipitate properties is substantiated. Metal precipitates with acceptable adhesion and low longitudinal resistance are obtained by selecting the electrolyte pretreatment and deposition mode.

Keywords: electrochemical deposition, $p$-Si, metal layer, metal deposition.

Received: 02.03.2020
Revised: 22.10.2020
Accepted: 09.11.2020

DOI: 10.21883/FTP.2021.03.50611.9385


 English version:
Semiconductors, 2021, 55:3, 384–386

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© Steklov Math. Inst. of RAS, 2024