RUS  ENG
Full version
JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2020 Volume 54, Issue 9, Pages 878–883 (Mi phts5164)

This article is cited in 4 papers

XXIV International symposium Nanophysics and nanoelectronics, Nizhny Novgorod, march 10-13, 2020

Investigation into microwave absorption in semiconductors for frequency-multiplication devices and radiation-output control of continuous and pulsed gyrotrons

K. V. Marem'yanina, V. Parshinb, E. A. Serovb, V. V. Rumyantseva, K. E. Kudryavtseva, A. A. Dubinova, A. P. Fokinb, S. S. Morozovc, V. Ya. Aleshkina, M. Yu. Glyavinb, G. G. Denisovb, S. V. Morozova

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b Institute of Applied Physics, Russian Academy of Sciences, Nizhny Novgorod
c Lobachevsky State University of Nizhny Novgorod

Abstract: The results of experimental investigation into the dielectric losses in GaAs, InP:Fe, and Si semiconductor crystals in the millimeter wavelength range (80–260 GHz) using the original precise method of measuring the reflectance and dielectric-loss tangent tan$\delta$ based on open high-quality Fabry–Perot cavities are presented. It is shown that the losses in the frequency range from 100 to 260 GHz in ultrapure semiconductor single-crystal GaAs substrates are mainly determined by lattice absorption, while the main loss mechanism in single-crystal silicon is absorption by free carriers; herewith, tan $\delta$ $\approx$ (1 – 2) $\times$ 10$^{-4}$ even for a noticeable, at a level of 10$^{12}$ cm$^{-3}$, free carrier concentration. In contrast with GaAs and Si, tan$\delta$ in compensated InP:Fe crystals is almost independent of frequency in the range from 100 to 260 GHz, which is associated with the material conductivity and optimization of microwave semiconductor devices, in particular, frequency-multiplication devices and devices of the controlled emission output of continuous and pulsed gyrotrons.

Keywords: subterahertz range, GaAs, InP:Fe, Si, absorption, dielectric-loss tangent.

Received: 15.04.2020
Revised: 21.04.2020
Accepted: 21.04.2020

DOI: 10.21883/FTP.2020.09.49825.17


 English version:
Semiconductors, 2020, 54:9, 1069–1074

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2025