Dependence of the crystallization kinetics of Cr$_{0.26}$Si$_{0.74}$ thin films on their thickness

In this work we study thermoelectric properties of Cr$_{0.26}$Si$_{0.74}$ thin films with thickness of 11, 14, 21, 31, 56, 74, 115 nm. The films were produced by magnetron sputtering onto unheated substrate. The films had amorphous structure. Thermoelectric properties of samples were studied during thermal annealing in pure helium atmosphere. Changing of thermoelectric properties during annealing indicated changing in structure. It was found that kinetic of crystallization depends on the thickness of the films. The thermopower of nanocrystalline films decreases with increasing film thickness, and the power factor reaches its maximum value in films with a thickness of 31 nm.