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Fizika i Tekhnika Poluprovodnikov, 2019 Volume 53, Issue 9, Pages 1263–1266 (Mi phts5413)

This article is cited in 7 papers

XXIII International symposium ''Nanophysics and Nanoelectronics'', Nizhny Novgorod, March 11–14, 2019

Chemical shift and exchange interaction energy of the $1s$ states of magnesium donors in silicon. The possibility of stimulated emission

V. N. Shastina, R. Kh. Zhukavina, K. A. Kovalevskya, V. V. Tsyplenkova, V. V. Rumyantseva, D. V. Shengurova, S. G. Pavlovb, V. B. Shumanc, L. M. Portsel'c, A. N. Lodyginc, Yu. A. Astrovc, N. V. Abrosimovd, J. M. Klopfe, H.-W. Hübersbf

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b Institute of Optical Sensor Systems, German Aerospace Center (DLR), Berlin, Germany
c Ioffe Institute, St. Petersburg
d Leibniz-Institut für Kristallzüchtung (IKZ), Berlin, Germany
e Helmholtz-Zentrum Dresden-Rossendorf, Dresden, German
f Department of Physics, Humboldt-Universität zu Berlin, Berlin, Germany

Abstract: The results of experiments aimed at the observation of split $1s$ states in Mg-doped Si are reported. From the results, it is possible to determine the chemical shift and exchange interaction energy of a neutral Mg donor in Si. The position of the $1s(E)$, $1s(T_2)$, and $2s(A_1)$ parastates determines the possibility for attaining population inversion and the specific mechanism of stimulated Raman scattering. The energy of the $1s(T_2)$ parastate is determined from the position of the Fano resonances in the photoconductivity spectrum of Si:Mg at $T$ = 4 K, and the energies of the $1s(T_2)$ and $1s(E)$ orthostates from the transmittance spectra at elevated temperatures. On the basis of the experimental data, the relaxation rates are estimated, and the possible mechanisms of stimulated emission are analyzed.

Keywords: neutral double donor, magnesium, spectroscopy, Fano resonance, photoconductivity, population inversion, stimulated Raman scattering.

Received: 24.04.2019
Revised: 29.04.2019
Accepted: 29.04.2019

DOI: 10.21883/FTP.2019.09.48135.18


 English version:
Semiconductors, 2019, 53:9, 1234–1237

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