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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2018 Volume 52, Issue 6, Pages 586–590 (Mi phts5806)

This article is cited in 3 papers

Semiconductor structures, low-dimensional systems, quantum phenomena

X-ray diffraction analysis of features of the crystal structure of GaN/Al$_{0.32}$Ga$_{0.68}$N HEMT-heterostructures by the Williamson–Hall method

S. S. Pushkareva, M. M. Grekhovb, N. V. Zenchenkoa

a V. G. Mokerov Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow
b National Engineering Physics Institute "MEPhI", Moscow

Abstract: The fitting of $\theta$/2$\theta$ and $\omega$ peaks in X-ray diffraction curves is shown to be most accurate in the case of using an inverse fourth-degree polynomial or probability density function with Student's distribution (Pearson type VII function). These functions describe well both the highest-intensity central part of the experimental peak and its low-intensity broadened base caused by X-ray diffuse scattering. The mean microdeformation $\varepsilon$ and mean vertical domain size $D$ are determined by the Williamson–Hall method for layers of GaN ($\varepsilon\approx$ 0.00006, $D\approx$ 200 nm) and Al$_{0.32}$Ga$_{0.68}$N ($\varepsilon$ = 0.0032 $\pm$ 0.0005, $D$ = 24 $\pm$ 7 nm). The $D$ value obtained for the Al$_{0.32}$Ga$_{0.68}$N layer is most likely to result from the nominal thickness of this layer, which is 11 nm.

Received: 06.06.2017
Accepted: 19.06.2017

DOI: 10.21883/FTP.2018.06.45920.8661


 English version:
Semiconductors, 2018, 52:6, 734–738

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