High-sensitivity photodetector based on atomically thin MoS$_{2}$

A design for a high-sensitivity photodetector with a single layer of MoS$_{2}$ transition-metal dichalcogenide used as the basic functional element is proposed and the process of its fabrication is presented step by step. Quality evaluation and the selection of functional MoS$_{2}$ flakes is based on the results of combined optical characterization. The main operating characteristics of the fabricated device are investigated and a photosensitivity of 1.4 mA/W is demonstrated. A difference of this device in comparison with existing analogues is its high photosensitivity at low operating voltages (in the range of $\pm$ 3 V).