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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2018 Volume 52, Issue 1, Pages 127–132 (Mi phts5953)

This article is cited in 8 papers

Manufacturing, processing, testing of materials and structures

Optimization of the structural properties and surface morphology of a convex-graded In$_{x}$Al$_{1-x}$As ($x$ = 0.05–0.83) metamorphic buffer layer grown via MBE on GaAs (001)

V. A. Solov'ev, M. Yu. Chernov, A. A. Sitnikova, P. N. Brunkov, B. Ya. Mel'tser, S. V. Ivanov

Ioffe Institute, St. Petersburg

Abstract: The results of optimization of the design and growth conditions of an In$_{x}$Al$_{1-x}$As metamorphic buffer layer with a high In content ($x$ = 0.05–0.83) grown via MBE on GaAs(001) substrates with the purpose of optimizing its surface morphological characteristics and structural properties and lowering the surface density of threading dislocations. The lowest surface-pattern roughness RMS = 2.3 nm (on an area of 10 $\times$ 10 $\mu$m) and density of threading dislocations of 5 $\times$ 10$^7$ cm$^{-2}$ are found in the samples with a convex-graded metamorphic buffer layer.

Received: 26.04.2017
Accepted: 10.05.2017

DOI: 10.21883/FTP.2018.01.45331.8626


 English version:
Semiconductors, 2018, 52:1, 120–125

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