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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 2018 Volume 52, Issue 1, Pages 138–142 (Mi phts5955)

This article is cited in 1 paper

Manufacturing, processing, testing of materials and structures

On a new mechanism for the realization of ohmic contacts

A. V. Sachenko, A. E. Belyaev, R. V. Konakova

Institute of Semiconductor Physics NAS, Kiev

Abstract: Analysis of the contact-barrier height taking into account the distribution of surface states along coordinate $x$ perpendicular to the insulator–semiconductor interface is performed for metal–semiconductor contacts with a dielectric gap. It is shown that taking into account the spatial dependence of the density of surface states at rather high semiconductor doping levels leads to a substantial decrease in the barrier height, which promotes the realization of ohmic contacts. It is established that the smaller the metal–semiconductor contact potential difference $\varphi_{ms}$, the stronger the effect of barrier-height lowering. If $\varphi_{ms}$ is negative, this effect can lead to potential sign reversal, i.e., to the realization of an enrichment layer in the space-charge region of the semiconductor even at a high density of surface states. This in turn promotes the manifestation of an anomalous dependence of the contact resistivity on temperature; the resistivity increases with an increase in temperature.

Received: 07.06.2017
Accepted: 08.06.2017

DOI: 10.21883/FTP.2018.01.45333.8618


 English version:
Semiconductors, 2018, 52:1, 131–135

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