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Fizika i Tekhnika Poluprovodnikov, 2017 Volume 51, Issue 12, Page 1697 (Mi phts5977)

This article is cited in 1 paper

Semiconductor physics

Emission-line width and $\alpha$-factor of 850-nm single-mode vertical-cavity surface-emitting lasers based on InGaAs/AlGaAs quantum wells

S. A. Blokhina, M. A. Bobrova, A. A. Blokhina, A. G. Kuz'menkovab, A. P. Vasil'evab, Yu. M. Zadiranova, E. A. Evropeitseva, A. V. Sakharova, N. N. Ledentsovc, L. Ya. Karachinskyad, A. M. Ospennikove, N. A. Maleeva, V. M. Ustinovabf

a Ioffe Institute, St. Petersburg
b Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences, St. Petersburg
c VI Systems GmbH, Berlin, Germany
d Connector Optics LLC, St. Petersburg
e Russian Institute of Radionavigation and Time, St. Petersburg
f Peter the Great St. Petersburg Polytechnic University

Abstract: The emission-line width for 850-nm single-mode vertical-cavity surface-emitting lasers based on InGaAs/AlGaAs quantum wells is studied. The width of the emission line for a laser with a 2-$\mu$m oxide current aperture attains it minimum ($\sim$110 MHz) at an output power of 0.8 mW. As the optical output power is further increased, anomalous broadening of the emission line is observed; this is apparently caused by an increase in the $\alpha$-factor as a result of a decrease in the differential gain in the active region under conditions of increased concentration of charge carriers and of high internal optical losses in the microcavity. The $\alpha$-factor is estimated using two independent methods.

Received: 25.05.2017
Accepted: 30.05.2017

DOI: 10.21883/FTP.2017.12.45188.8657


 English version:
Semiconductors, 2018, 52:1, 93–99


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