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Fizika i Tekhnika Poluprovodnikov, 2017 Volume 51, Issue 9, Pages 1176–1181 (Mi phts6035)

This article is cited in 2 papers

Electronic properties of semiconductors

Optical properties of metamorphic hybrid heterostuctures for vertical-cavity surface-emitting lasers operating in the 1300-nm spectral range

A. V. Babichevabc, N. V. Kryzhanovskayaa, È. I. Moiseeva, A. G. Gladyshevbc, L. Ya. Karachinskybdc, I. I. Novikovbdc, S. A. Blokhind, M. A. Bobrovd, Yu. M. Zadiranovd, S. I. Troshkovd, A. Yu. Egorovbc

a Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
b St. Petersburg National Research University of Information Technologies, Mechanics and Optics
c Connector Optics LLC, St. Petersburg
d Ioffe Institute, St. Petersburg

Abstract: The possibility of fabricating hybrid metamorphic heterostructures for vertical-cavity surfaceemitting lasers working in the 1300-nm spectral range is demonstrated. The metamorphic semiconductor part of the heterostructure with a GaAs/AlGaAs distributed Bragg reflector and an active region based on InAlGaAs/InGaAs quantum wells is grown by molecular-beam epitaxy on a GaAs (100) substrate. The top dielectric mirror with a SiO$_{2}$/Ta$_{2}$O$_{5}$ distributed Bragg reflector is formed by magnetron sputtering. The spectra of the room-temperature microphotoluminescence of these vertical-cavity surface-emitting laser heterostructures are studied under 532-nm excitation in the power range of 0–70 mW (with a focused-beam diameter of $\sim$1 $\mu$m). The superlinear dependence of the photoluminescence intensity on the excitation power, narrowing of the photoluminescence peaks, and a change in the modal composition may be indications of lasing. The results obtained give evidence that the technology of the metamorphic growth of heterostructures on GaAs substrates can be used for the fabrication of vertical-cavity surface-emitting lasers working in the 1300- nm spectral range.

Received: 15.02.2017
Accepted: 22.02.2017

DOI: 10.21883/FTP.2017.09.44879.8557


 English version:
Semiconductors, 2017, 51:9, 1127–1132

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