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Fizika i Tekhnika Poluprovodnikov, 2016 Volume 50, Issue 8, Pages 1030–1035 (Mi phts6381)

This article is cited in 15 papers

Surface, interfaces, thin films

Electrical, optical, and photoluminescence properties of ZnO films subjected to thermal annealing and treatment in hydrogen plasma

Kh. A. Abdullina, M. T. Gabdullina, L. V. Gritsenkob, D. V. Ismailova, Zh. K. Kalkozovaa, S. E. Kumekovb, Zh. O. Mukashb, A. Yu. Sazonovc, E. I. Terukovd

a National Nanotechnology Laboratory of open type, al-Farabi KazNU, Almaty, Kazakhstan
b Kazakh National Technical University after K. I. Satpaev, Almaty, Kazakhstan
c University of Waterloo, Waterloo, Canada
d Ioffe Institute, St. Petersburg

Abstract: The photoluminescence and optical absorption spectra and electrical properties of ZnO films grown by the metal–organic chemical vapor deposition and hydrothermal techniques, subjected to heat treatments and plasma treatment in a hydrogen atmosphere, are studied. It is shown that the adsorption of oxygen at grain boundaries upon annealing in an oxidizing atmosphere determines the electrical properties of the films. Vacuum annealing improves the electrical properties of the samples after degradation induced by annealing in air. Treatment in hydrogen plasma passivates surface states at the grain boundaries. The intrinsic photoluminescence intensity after plasma treatment is higher in the case of increased amounts of oxygen adsorbed at grain surfaces upon annealing in air. Surface states involving oxygen and hydrogen atoms are responsible for the high-intensity intrinsic photoluminescence band.

Received: 18.01.2016
Accepted: 25.01.2016


 English version:
Semiconductors, 2016, 50:8, 1010–1014

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