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Fizika i Tekhnika Poluprovodnikov, 2020 Volume 54, Issue 12, Page 1374 (Mi phts6681)

This article is cited in 3 papers

Semiconductor physics

Analytical drain current modeling and simulation of triple material gate-all-around heterojunction TFETs considering depletion regions

C. Usha, P. Vimala

Department of Electronics and Communication, Dayananda Sagar College of Engineering, Bangalore, Karnataka, India

Abstract: This paper deals with electrostatic behavior of triple-material gate-all-around hetero-junction tunneling field-effect transistors (TMGAA-HJTFET) device. The model is advantageous in apprehending a comparative study with the single-material gate-all-around hetero-junction tunneling field-effect transistors (SMGAA-HJTFET) in terms of surface potential, electric field, drain current, transconductance, and threshold voltage. The surface-potential distribution in partition regions along the channel is solved by using two-dimensional Poisson’s equation. By using the drift and diffusion current, drain current is derived, and $I_{\operatorname{On}}/I_{\operatorname{Off}}$ ratio of 10$^{11}$ is gained from analytical modeling and TCAD simulation. Transconductance and threshold voltage are derived from the tunneling current. The proposed model results are validated by the ATLAS TCAD simulation tool.

Keywords: drain current, surface potential, electric field, TFETs, TCAD simulation.

Received: 11.05.2020
Revised: 07.07.2020
Accepted: 13.08.2020

Language: English


 English version:
Semiconductors, 2020, 54:12, 1634–1640


© Steklov Math. Inst. of RAS, 2024