Modified structure of the nanocrystalline ito films

A novel method for the combined deposition of transparent conducting films of indium and tin oxide has been suggested. The method consists of sequential deposition of the material by magnetron sputtering and electron beam evaporation onto a hot substrate. The structural features and optical characteristics of the resulting films have been studied. The considered method makes it possible to modify the density of the coating, and, hence, the profile of its effective refractive index. A controlled increase in the specific surface area of films, which is achieved by the growth of nanowhiskers at the second stage of film deposition, may be in demand in a number of new devices, for example, sensors.