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Fizika i Tekhnika Poluprovodnikov, 2023 Volume 57, Issue 8, Pages 658–662 (Mi phts6941)

Surface, interfaces, thin films

Optical properties and structure of indium oxide films obtained under various conditions of magnetron sputtering

A. A. Tikhiia, Yu. M. Nikolaenkob, E. A. Sviridovabc, I. V. Zhikharevb

a Lugansk State Pedagogical University, 291011 Lugansk, Russia
b Galkin Donetsk Institute for Physics and Engineering, 283048 Donetsk, Russia
c Donbas National Academy of Civil Engineering and Architecture, 286123 Makeyevka, Russia

Abstract: In this paper we summarize the studies of the structural and optical properties of In$_2$O$_3$ films on Al$_2$O$_3$ (012) substrates obtained by dc magnetron sputtering. According to X-ray diffraction, deposition time effects on the position and half-width of the (222) peak of cubic In$_2$O$_3$. Ellipsometric measurements and analysis of optical transmission spectra show that films obtained at temperatures of 300$^\circ$C or more have uniform optical properties, except the surface layer. The refractive index of films obtained at room temperature increases along the direction from the substrate to the surface. Annealing eliminates this inhomogeneity, reduces the observed band gap due to a decrease in the concentration of lattice defects, but do not effects on the true band gap.

Keywords: indium oxide films, band gap, optical properties, X-ray diffraction, magnetron sputtering.

Received: 26.07.2023
Revised: 04.09.2023
Accepted: 06.12.2023

DOI: 10.61011/FTP.2023.08.56964.5458



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