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Fizika i Tekhnika Poluprovodnikov, 2022 Volume 56, Issue 10, Pages 1002–1010 (Mi phts7139)

Semiconductor physics

Study of active regions based on multiperiod GaAsN/InAs superlattice

A. V. Babicheva, E. V. Pirogovb, M. S. Sobolevb, D. V. Denisovb, N. A. Fominykhbc, A. I. Baranovb, A. S. Gudovskikhb, I. A. Melnichenkobc, P. A. Yunind, V. N. Nevedomskiye, M. V. Tokareve, B. Ya. Bere, A. G. Gladysheva, L. Ya. Karachinskya, I. I. Novikova, A. Yu. Egorovb

a ITMO University, 197101 St. Petersburg, Russia
b Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, 194021 St. Petersburg, Russia
c National Research University "Higher School of Economics", St. Petersburg Branch, 190008 St. Petersburg, Russia
d Institute for Physics of Microstructures, Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia
e Ioffe Institute, 194021 St. Petersburg, Russia

Abstract: The results of a study of nitrogen-containing active regions based on superlattices grown on GaAs substrates are presented. Active regions based on alternating InAs and GaAsN layers were fabricated by molecular-beam epitaxy using a nitrogen plasma source. Based on the XRD analysis, the thicknesses and average composition of superlattice layers are estimated. The study of dark-field images obtained by transmission electron microscopy showed the presence of interdiffusion of InAs into GaAsN. The results of a study of the photoluminescence and electroluminescence spectra at different pump levels are presented. Efficient electroluminescence is demonstrated near 1150 nm with a full width at half-maximum of about $\sim$90 meV.

Keywords: superlattices, molecular beam epitaxy, gallium arsenide, dilute nitride, GaAsN, InAs.

Received: 23.08.2022
Revised: 26.09.2022
Accepted: 26.09.2022

DOI: 10.21883/FTP.2022.10.53963.9951



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