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Fizika i Tekhnika Poluprovodnikov, 2015 Volume 49, Issue 9, Pages 1278–1281 (Mi phts7396)

This article is cited in 20 papers

Semiconductor physics

Characterization of field-emission cathodes based on graphene films on SiC

R. V. Konakovaa, O. B. Okhrimenkoa, A. M. Svetlichnyib, O. A. Ageevb, E. Yu. Volkovb, A. S. Kolomiytsevb, I. L. Zhityaevb, O. B. Spiridonovc

a Institute of Semiconductor Physics NAS, Kiev
b Institute of Nanotechnologies, Electronics and Equipment Engineering
c Southern Laser Technology Center, Taganrog

Abstract: The properties of a point field-emission cathode representing a structure in the form of a silicon carbide tip coated with a thin graphene film are assessed. For the point cathode with the graphene coating, the current–voltage characteristics are constructed in the Fowler–Nordheim coordinates; the work functions $\varphi$ of the point cathode are calculated by their slope. The possibility of forming heavily doped $n^+$-SiC on the point surface by the sublimation of low-threshold field emission cathodes with low threshold electric fields and field-emission currents is shown.

Received: 04.02.2014
Accepted: 19.02.2015


 English version:
Semiconductors, 2015, 49:9, 1242–1245

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