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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 2, Pages 220–224 (Mi phts7514)

This article is cited in 2 papers

Surface, interfaces, thin films

Effect of exposure to optical radiation and temperature on the electrical and optical properties of In$_2$O$_3$ films produced by autowave oxidation

I. A. Tambasovab, V. G. Myagkovab, A. A. Ivanenkoa, L. E. Bykovaa, E. V. Yozhikovac, I. A. Maksimovb, V. V. Ivanovb

a L. V. Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, Krasnoyarsk
b JSC "Information Satelline Systems Reshetnev Company", Zheleznogorsk
c M. F. Reshetnev Siberian State Aerospace University,

Abstract: Indium-oxide films are synthesized by the autowave-oxidation reaction. It is shown that, upon exposure to optical radiation, the resistance of the films sharply decreases and the maximal relative change in the resistance is 52% at room temperature. Two resistance relaxation rates after termination of the irradiation, 15 $\Omega$ s$^{-1}$ during the first 30 s and 7 $\Omega$ s$^{-1}$ over the remaining time, are determined. The data of infrared spectroscopy of the films show that exposure to optical radiation induces a 2.4% decrease in the transmittance at a wavelength of 6.3 $\mu$m. It is found that, after termination of the irradiation, the transmittance gradually increases with a rate of 0.006% s$^{-1}$. It is suggested that photoreduction is the dominant mechanism responsible for changes in the electrical and optical properties of the In$_2$O$_3$ films.

Received: 12.03.2013
Accepted: 26.03.2013


 English version:
Semiconductors, 2014, 48:2, 207–211

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