Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films

Transparent conductive tin-doped indium-oxide films are produced by alternate processes of reactive high-frequency magnetron sputtering and ion treatment. The stressed states of the indium-tinoxide (ITO) films are studied by X-ray diffraction analysis. The effect of the technological conditions on changes in mactostresses in the ITO films is shown.