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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 8, Pages 1123–1131 (Mi phts7678)

This article is cited in 10 papers

Manufacturing, processing, testing of materials and structures

Structural and optical properties of heavily doped Al$_x$Ga$_{1-x}$As$_{1-y}$P$_y$:Mg alloys produced by metal-organic chemical vapor deposition

P. V. Seredina, A. S. Len'shina, A. V. Glotova, I. N. Arsent'evb, D. A. Vinokurovb, I. S. Tarasovb, T. Prutskijc, H. Leisted, M. Rinked

a Voronezh State University
b Ioffe Institute, St. Petersburg
c Instituto de Ciencias, Benemérita Universidad Autónoma de Puebla, 3417, Col San Miguel Hueyotlipan, 72050 Puebla, Pue., Mexico
d Karlsruhe Nano Micro Facility, 76344 Eggenstein-Leopoldshafen, Germany

Abstract: The high-resolution X-ray diffraction technique, Raman spectroscopy, and photoluminescence spectroscopy are used to study the structural, optical, and electron energy properties of epitaxial Al$_x$Ga$_{1-x}$As$_{1-y}$P$_y$:Mg alloy films grown by metal-organic chemical vapor deposition (MOCVD). It is shown that the introduction of a Mg impurity into the quaternary alloy provides high charge-carrier concentrations. A decrease in the growth temperature yields a decrease in the charge-carrier concentration in films doped with magnesium at a small gas-carrier flux of the acceptor impurity, whereas an increase in the flux results in an increase in the acceptor-impurity concentration, which is reflected in the character of the photoluminescence spectra.

Received: 02.12.2013
Accepted: 23.12.2013


 English version:
Semiconductors, 2014, 48:8, 1094–1102

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