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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 11, Pages 1484–1486 (Mi phts7742)

This article is cited in 4 papers

Surface, interfaces, thin films

Electron diffraction study of the phase formation of Tl–Fe–Se and kinetics of phase transformations of films TlFeSe$_2$

E. B. Askerovab, A. I. Madadzadaac, D. I. Ismailovc, R. N. Mehtievaa

a Joint Institute for Nuclear Research, Dubna, Moscow region
b Institute of radiation problems, ANAS
c Institute of Physics Azerbaijan Academy of Sciences

Abstract: The conditions of phase formation in the Tl–Fe–Se system and the crystallization kinetics of amorphous TlFeSe$_2$ films are investigated by electron-diffraction structural analysis and kinematic electronography. It is shown that the crystallization of amorphous TlFeSe$_2$ films is described by the analytical expression of kinetic phase-transformation curves $V_t=V_0[1-\exp(kt^m)]$. The growth dimensionality during the crystallization of amorphous TlFeSe$_2$ equal to three and the activation energies of nucleation and crystal growth are determined.

Received: 18.03.2014
Accepted: 28.03.2014


 English version:
Semiconductors, 2014, 48:11, 1449–1451

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