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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 11, Pages 1484–1486 (Mi phts7742)

Surface, interfaces, thin films

Electron diffraction study of the phase formation of Tl–Fe–Se and kinetics of phase transformations of films TlFeSe$_2$

E. B. Askerovab, A. I. Madadzadaac, D. I. Ismailovc, R. N. Mehtievaa

a Joint Institute for Nuclear Research, Dubna, Moscow region
b Institute of radiation problems, ANAS
c Institute of Physics Azerbaijan Academy of Sciences

Abstract: The conditions of phase formation in the Tl–Fe–Se system and the crystallization kinetics of amorphous TlFeSe$_2$ films are investigated by electron-diffraction structural analysis and kinematic electronography. It is shown that the crystallization of amorphous TlFeSe$_2$ films is described by the analytical expression of kinetic phase-transformation curves $V_t=V_0[1-\exp(kt^m)]$. The growth dimensionality during the crystallization of amorphous TlFeSe$_2$ equal to three and the activation energies of nucleation and crystal growth are determined.

Received: 18.03.2014
Accepted: 28.03.2014


 English version:
Semiconductors, 2014, 48:11, 1449–1451

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