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Fizika i Tekhnika Poluprovodnikov, 2013 Volume 47, Issue 7, Pages 990–996 (Mi phts7975)

This article is cited in 8 papers

Manufacturing, processing, testing of materials and structures

Study of new designs for the InAlAs metamorphic buffer on GaAs substrates with distributed compensation of elastic deformations

G. B. Galieva, S. S. Pushkarevab, I. S. Vasil'evskiib, E. A. Klimova, R. M. Imamovc

a V. G. Mokerov Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow
b National Engineering Physics Institute "MEPhI", Moscow
c Institute of Cristallography Russian Academy of Sciences, Moscow

Abstract: Two new designs for a metamorphic buffer, which are modifications of the In$_x$Al$_{1-x}$As metamorphic buffer due to groups of layers with differing lattice parameters, are proposed and implemented. This makes it possible to affect the relaxation of the metamorphic buffer. The structural and electrical characteristics of the obtained metamorphic HEMT nanoheterostructures are also studied.

Received: 11.09.2012
Accepted: 17.09.2012


 English version:
Semiconductors, 2013, 47:7, 997–1002

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