Specific features of amorphous silicon layers grown by plasma-enhanced chemical vapor deposition with tetrafluorosilane

Hydrogenated amorphous silicon layers with crystalline nanoparticles have been produced by plasma-enhanced chemical vapor deposition, with tetrafluorosilane added to the gas mixture. The photoluminescence kinetics and photoelectric properties of structures based on these layers have been studied. The structures have a substantial photoresponse efficiency in the visible spectral range, with the position of the photoresponse maximum dependent on the applied bias.