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Pisma v Zhurnal Tekhnicheskoi Fiziki, 1985 Volume 11, Issue 24, Pages 1512–1515 (Mi pjtf1091)
Element component rupture in $Si\,O_2$ during ion-activated chemical etching

L. J. Ðãànyavichyus, S. I. Tamulevichus, A. P. Matukas

Kaunas University of Technology

Received: 24.07.1985



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