S. A. Gurevich, A. V. Kolobov, V. M. Lyubin, S. I. Nesterov, M. M. Kulagina, F. N. Timofeev, S. I. Troshkov, “APPLICATION OF AS2S3-ORGANIC PHOTORESIST MASK FOR REACTIVE ION ETCHING OF SEMICONDUCTORS-A(III)B(V)”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 1992, Volume 18, Issue 17,Pages <nobr>85

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Pisma v Zhurnal Tekhnicheskoi Fiziki, 1992 Volume 18, Issue 17, Pages 85–90 (Mi pjtf4459)

APPLICATION OF AS2S3-ORGANIC PHOTORESIST MASK FOR REACTIVE ION ETCHING OF SEMICONDUCTORS-A(III)B(V)

S. A. Gurevich, A. V. Kolobov, V. M. Lyubin, S. I. Nesterov, M. M. Kulagina, F. N. Timofeev, S. I. Troshkov

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