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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2021 Volume 47, Issue 23, Pages 12–14 (Mi pjtf4607)

Study of the critical angle of channeling of active metal ions through thin aluminum films

Z. A. Isakhanova, B. E. Umirzakovb, S. S. Nasriddinovc, Z. E. Ìuhtarova, R. M. Yorkulova

a Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent
b Tashkent State Technical University named after Islam Karimov
c National University of Uzbekistan named after M. Ulugbek, Tashkent

Abstract: The spatial distributions of ions (K$^+$, Na$^+$) passed through thin polycrystalline and single-crystalline Al films with the thickness from 180 to 600 $\mathring{\mathrm{A}}$ and critical channeling angles have been studied. The ion energies have been varied within the range $E_0$ = 10–30 keV. It has been shown that an increase in the energy of the primary ion beam leads to a decrease in the width of the maxima of the angular distribution, which is associated with a decrease in the critical channeling angle $\psi_{cr}$. It has been found that the value $\psi_{cr}$ does not exceed 4–50 for axial channeling and 9–100 for planar channeling.

Keywords: critical angle, passage of ions, angular distribution, channeling, spatial distribution.

Received: 07.06.2021
Revised: 18.08.2021
Accepted: 19.08.2021

DOI: 10.21883/PJTF.2021.23.51776.18910



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