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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2020 Volume 46, Issue 2, Pages 44–46 (Mi pjtf5215)

This article is cited in 6 papers

Resistive switching in memristors based on Ag/Ge/Si heterostructures

O. N. Gorshkov, V. G. Shengurov, S. A. Denisov, V. Yu. Chalkov, I. N. Antonov, A. V. Kruglov, M. E. Shenina, V. E. Kotomina, D. O. Filatov, D. A. Serov

National Research Lobachevsky State University of Nizhny Novgorod

Abstract: Ag/Ge/Si heterostructures with threading dislocations in Ge layer can exhibit resistive switching (RS) in two regimes: (i) bipolar and (ii) volatile unipolar. In both regimes, these structures possess stable states with the ratio of currents in the low-resistance state (LRS) and high-resistance state (HRS) within 1.5–2.7. The volatile unipolar switching can be determined by capturing charge carriers on deep levels related to misfit dislocations at the Ge/Si interface, whereas the bipolar switching is related to the drift of Ag$^+$ ions via threading dislocations.

Keywords: Ge films, memristor, resistive switching, dislocation, semiconductor.

Received: 14.10.2019
Revised: 14.10.2019
Accepted: 24.10.2019

DOI: 10.21883/PJTF.2020.02.48953.18075


 English version:
Technical Physics Letters, 2020, 46:1, 91–93

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