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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019 Volume 45, Issue 21, Pages 48–50 (Mi pjtf5283)

This article is cited in 5 papers

Synthesis by molecular beam epitaxy and properties of InGaN nanostructures of branched morphology on a silicon substrate

R. R. Reznika, K. P. Kotlyarb, N. V. Kryzhanovskayab, S. V. Morozovcd, G. E. Cirlinabefg

a St. Petersburg National Research University of Information Technologies, Mechanics and Optics
b Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
c Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
d National Research Lobachevsky State University of Nizhny Novgorod
e Institute for Analytical Instrumentation, Russian Academy of Sciences, St. Petersburg
f Peter the Great St. Petersburg Polytechnic University
g Saint Petersburg Electrotechnical University "LETI"

Abstract: The principal possibility of synthesis of InGaN nanostructures of branched morphology (“nanoflowers”) by molecular beam epitaxy on the surface of a silicon substrate has been demonstrated. The results of morphological studies have shown that the development of the morphology of InGaN nanostructures occurs in several stages even when maintaining a constant substrate temperature. The grown structures exhibit a photoluminescence line in a wide wavelength range from 450 to 950 nm at room temperature.

Keywords: nitride nanostructures, silicon, molecular beam epitaxy, semiconductors, optoelectronics.

Received: 11.07.2019
Revised: 18.07.2019
Accepted: 18.07.2019

DOI: 10.21883/PJTF.2019.21.48475.17975


 English version:
Technical Physics Letters, 2019, 45:11, 1111–1113

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