Studying the formation of antireflection coatings on multijunction solar cells

The formation of antireflection coating on multijunction solar cells based on А$_{3}$В$_{5}$ semiconductor heterostructures has been studied at the stage of structure surface processing by methods of plasmachemical, wet chemical, and ion-beam etching. A technology of creating antireflection coatings based on ТiO$_{x}$/SiO$_{2}$ layers is developed. The obtained coatings are characterized by improved adhesion to the surface of heterostructure and reduced reflection coefficient of multijunction solar cells.