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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019 Volume 45, Issue 19, Pages 3–6 (Mi pjtf5299)

This article is cited in 9 papers

Studying the effect of doping with nickel on silicon-based solar cells with a deep $p$$n$-junction

M. K. Bakhadyrkhanova, S. B. Isamova, Z. T. Kenzhaevb, S. V. Koveshnikova

a Tashkent State Technical University, Tashkent, Uzbekistan
b Karakalpak State University named after Berdakh, Nukus, Uzbekistan

Abstract: It is shown that doping front side of solar cell with deep-lying $p$$n$ junction with nickel atoms leads to significant increase in $J_{sc}$ – 89% and $V_{oc}$ – 19.7%. Additional heat treatment at 700$^{\circ}$C for one hour leads to an increase in $J_{sc}$ – 98,4% and $V_{oc}$ – 13,18%. Growth in efficiency of conversion of infrared radiation is occurs due to formation of clusters of nickel atoms, which are getter centers for uncontrolled recombination impurities.

Keywords: silicon, nickel, doping, thermo-annealing, clusters, collection coefficient, lifetime.

Received: 03.06.2019
Revised: 11.06.2019
Accepted: 13.06.2019

DOI: 10.21883/PJTF.2019.19.48307.17902


 English version:
Technical Physics Letters, 2019, 45:10, 959–962

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