RUS  ENG
Full version
JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2019 Volume 45, Issue 3, Pages 30–33 (Mi pjtf5548)

This article is cited in 10 papers

Contraction of microwave discharge in the reactor for chemical vapor deposition of diamond

S. A. Bogdanov, A. M. Gorbachev, D. B. Radishev, A. L. Vikharev, M. A. Lobaev

Institute of Applied Physics, Russian Academy of Sciences, Nizhny Novgorod

Abstract: It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.

Received: 12.11.2018

DOI: 10.21883/PJTF.2019.03.47269.17585


 English version:
Technical Physics Letters, 2019, 45:2, 89–92

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2025