A. A. Bobkov, I. A. Pronin, V. A. Moshnikov, N. D. Yakushova, A. A. Karmanov, I. A. Averin, P. A. Somov, E. I. Terukov, “Creating lithographic pictures using faceted zinc oxide microparticles on a silicon substrate”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2018, Volume 44, Issue 15,Pages <nobr>87

This article is cited in 7 papers

Creating lithographic pictures using faceted zinc oxide microparticles on a silicon substrate

A. A. Bobkov^ab, I. A. Pronin^ab, V. A. Moshnikov^ab, N. D. Yakushova^a, A. A. Karmanov^a, I. A. Averin^a, P. A. Somov^b, E. I. Terukov^c

^a Penza State University
^b Saint Petersburg Electrotechnical University "LETI"
^c Ioffe Institute, St. Petersburg

Abstract: Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.

Received: 07.03.2018

DOI: 10.21883/PJTF.2018.15.46445.17281