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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2017 Volume 43, Issue 20, Pages 86–94 (Mi pjtf6101)

This article is cited in 6 papers

Nanocrystalline $\alpha$-Al$_{2}$O$_{3}$ coatings obtained by reactive thermal anodic evaporation in arc discharge at low temperature

N. V. Gavrilova, A. S. Kamenetskikha, P. V. Tretnikova, A. V. Chukinb

a Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Ekaterinburg
b Ural Federal University named after the First President of Russia B. N. Yeltsin, Ekaterinburg

Abstract: Al$_{2}$O$_{3}$ nanocrystalline coatings are obtained for the first time by anodic thermal evaporation of aluminum in an arc discharge in an oxygen–argon mixture at a temperature of 600$^\circ$C on stainless-steel substrates with a Cr$_{2}$O$_{3}$ sublayer. The effect of the surface state of the samples and ion energy on the phase composition, microstructure, and properties of the coating is assessed. The $\alpha$-Al$_{2}$O$_{3}$ phase is formed in the range of the bias potential of 25–200 V, with the growth of which the microcrystallite size decreases from 60 to 15 nm and the hardness of the coating increases from 8 to 20 GPa.

Received: 05.06.2017

DOI: 10.21883/PJTF.2017.20.45154.16903


 English version:
Technical Physics Letters, 2017, 43:10, 951–954

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