Graphene synthesis by cold implantation of carbon recoil atoms

A new method of introducing carbon into catalytic metal films for graphene synthesis is proposed. The method is based on the phenomenon of carbon recoil atoms from a layer of methane molecules that are adsorbed on a metal film being incorporated into this film under the action of bombardment with inert gas ions. To increase the thickness of adsorbed methane layer, the substrate is cooled down to -190$^\circ$C. The proposed method has been implemented on a polycrystalline nickel film. After the final annealing, Raman spectroscopy showed the presence of numerous fragments of multilayer graphene on the film surface.