RUS  ENG
Full version
JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive
Pisma v Zhurnal Tekhnicheskoi Fiziki, 1987 Volume 13, Issue 20, Pages 1242–1247 (Mi pjtf657)
Structural reorganization, induced by silicide formation in ion-irradiated silicon

S. V. Vasil'ev, N. N. Gerasimenko, V. V. Kalinin

Institute of Semiconductor Physics of USSR Academy of Sciences, Siberian Branch, Novosibirsk

Received: 23.07.1987



Bibliographic databases:

© Steklov Math. Inst. of RAS, 2024