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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2024 Volume 50, Issue 1, Pages 36–38 (Mi pjtf6581)

Numerical modelling of aluminum distribution profiles in the Al–Ga–As–Sn epitaxial layer

N. S. Potapovich, V. P. Khvostikov, O. A. Khvostikova, A. S. Vlasov

Ioffe Institute, St. Petersburg, Russia

Abstract: In this work, we simulated the concentration profiles of $n$–AlGaAs layers doped with tin during growth by liquid-phase epitaxy from a melt of limited height. The possibility of obtaining thick gradient waveguide layers from melts with different tin content is shown. The influence of the solvent composition on the effect of aluminum profile gradient inversion has been studied.

Keywords: AlGaAs, phase equilibrium, liquid phase epitaxy, photovoltaic cells.

Received: 07.09.2023
Revised: 11.10.2023
Accepted: 13.10.2023

DOI: 10.61011/PJTF.2024.01.56924.19721



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© Steklov Math. Inst. of RAS, 2025