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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2024 Volume 50, Issue 3, Pages 40–43 (Mi pjtf6603)

Formation of the Nb$_3$Sn phase by treating the Nb+Sn system with a pulsed electron beam

Y. N. Yurjeva, A. V. Yuryevaa, A. I. Saveljeva, M. S. Vorobyovb, P. V. Moskvinb

a Tomsk Polytechnic University, Tomsk, Russia
b Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia

Abstract: The possibility of processing Nb–Sn films, which were deposited by magnetron sputtering, with a pulsed electron beam was investigated. Irradiation of coatings leads to the formation of the Nb$_3$Sn phase. The films were irradiated with different beam energy densities and pulse durations. The surface morphology and phase composition of irradiated films were studied.

Keywords: magnetron sputtering, Nb$_3$Sn films, electron beam, plasma cathode, electron beam processing.

Received: 27.09.2023
Revised: 09.11.2023
Accepted: 09.11.2023

DOI: 10.61011/PJTF.2024.03.57043.19741



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