Abstract:
The possibility of processing Nb–Sn films, which were deposited by magnetron sputtering, with a pulsed electron beam was investigated. Irradiation of coatings leads to the formation of the Nb$_3$Sn phase. The films were irradiated with different beam energy densities and pulse durations. The surface morphology and phase composition of irradiated films were studied.
Keywords:magnetron sputtering, Nb$_3$Sn films, electron beam, plasma cathode, electron beam processing.