A. F. Pal', A. N. Ryabinkin, A. O. Serov, T. V. Rakhimova, A. S. Vishnevskiy, D. S. Seregin, K. A. Vorotilov, M. R. Baklanov, “Stability of low-k organosilicate dielectrics with benzene bridges to vacuum ultraviolet plasma radiation during Ta barrier layer deposition”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2024, Volume 50, Issue 4,Pages <nobr>34

Stability of low-k organosilicate dielectrics with benzene bridges to vacuum ultraviolet plasma radiation during Ta barrier layer deposition

A. F. Pal'^a, A. N. Ryabinkin^a, A. O. Serov^a, T. V. Rakhimova^a, A. S. Vishnevskiy^b, D. S. Seregin^b, K. A. Vorotilov^b, M. R. Baklanov^b

^a Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, Moscow, Russia
^b MIREA — Russian Technological University, Moscow, Russia

Abstract: The stability of low-k periodic mesoporous organosilicate low-k dielectrics with benzene bridges to VUV plasma radiation during the deposition of tantalum barrier layers by magnetron sputtering with additional ionization by inductively coupled plasma has been studied. The correlation of composition and porous structural features of the samples with their hydrophobicity and resistance to VUV was found.

Keywords: low low-k dielectrics, VUV, barrier layers, PVD.

Received: 29.08.2023
Revised: 09.11.2023
Accepted: 16.11.2023

DOI: 10.61011/PJTF.2024.04.57099.19711