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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2024 Volume 50, Issue 17, Pages 7–10 (Mi pjtf6751)

Formation of InAs$_{1-x}$N$_x$ islands and InAs stem-assisted InAs$_{1-x}$N$_x$ nanowires by means of epitaxial growth on silicon

A. K. Kaveeva, D. V. Minivb, V. V. Fedorovb

a Ioffe Institute, St. Petersburg, Russia
b Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg, Russia

Abstract: The possibility of forming InAs$_{1-x}$N$_x$ nanowires on InAs stems on the Si(111) surface coated with partly destructed silicon oxide was demonstrated. Formation of parasitic islands was also detected. It was revealed that in the first case the predominantly wurtzite structural phase is formed, while in the second case the sphalerite structural phase dominates.

Keywords: InAs$_{1-x}$N$_x$, dilute nitride, nanowires, molecular beam epitaxy.

Received: 04.04.2024
Revised: 26.04.2024
Accepted: 07.05.2024

DOI: 10.61011/PJTF.2024.17.58572.19941



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© Steklov Math. Inst. of RAS, 2025