Abstract:
The article discusses the method of neutralization of surface traps in the structures of gallium nitride transistors with high electron mobility (GaN HEMT), based on the use of step-by-step temperature exposure – thermal training. Calculations and experimental studies of the effect of traps on the static characteristics of GaN HEMT have been carried out, and effective ways of dealing with traps have been proposed, in particular, using the proposed optimal thermal training modes.