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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2022 Volume 48, Issue 4, Pages 15–19 (Mi pjtf7235)

Plasma-chemical method of silicon carbide modification to obtain particles with controlled surface morphology

T. A. Shalyginaab, M. S. Rudenkoa, I. V. Nemtsevbcd, V. A. Parfenove, S. Yu. Voroninaa

a M. F. Reshetnev Siberian State University of Science and Technologies, Krasnoyarsk, Russia
b Siberian Federal University, Krasnoyarsk, Russia
c Krasnoyarsk Scientific Center of the Siberian Branch of the Russian Academy of Sciences, Krasnoyarsk, Russia
d L. V. Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, Krasnoyarsk
e Institute of Chemistry and Chemical Technology, Federal Research Center KSC SB RAS, Russian Academy of Sciences, Krasnoyarsk, Russia

Abstract: A plasma-chemical method for the modification of silicon carbide particles is presented, which makes it possible to obtain particles with a controlled surface morphology. The variable parameter of particle processing was the ratio of the fraction of plasma-forming (Ar) and additional (H) gases. It was shown that at Ar/H = 100/0, the formation of a carbon shell is observed; at Ar/H ratios of 91/9 and 84/16, the particles are characterized by a carbon shell decorated with silicon nanoparticles or nanowires, respectively. The modified particles were analyzed using scanning electron microscopy and Raman spectroscopy.

Keywords: silicon carbide, plasma chemistry, surface morphology, nanoparticles, nanowires, carbon shell, core-shell.

Received: 01.10.2021
Revised: 02.11.2021
Accepted: 08.11.2021

DOI: 10.21883/PJTF.2022.04.52078.19042



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