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JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2022 Volume 48, Issue 7, Pages 16–19 (Mi pjtf7275)

This article is cited in 2 papers

Functionalization of low-k surfaces with low-energy Ar ions

A. A. Solovykha, A. A. Sychevab, E. N. Voroninaab

a Lomonosov Moscow State University, Moscow, Russia
b Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, Moscow, Russia

Abstract: In this work low-energy Ar impacts on low-k surfaces were simulated with ab initio density functional theory method. The obtained results reveal the mechanism of CH$_3$-group removal under Ar atom/ion irradiation; the threshold energy of this process was estimated.

Keywords: low-k dielectrics, functionalization, simulation, diffusion barriers, methyl groups.

Received: 19.11.2021
Revised: 13.01.2022
Accepted: 16.01.2022

DOI: 10.21883/PJTF.2022.07.52286.19085



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