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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2022 Volume 48, Issue 17, Pages 20–23 (Mi pjtf7389)

AlGaAs/InGaAs/GaAs heterostructures for pHEMT switching transistors

D. Yu. Protasovab, D. V. Dmitrieva, K. S. Zhuravleva, G. I. Ayzenshtatc, A. Yu. Yushchenkoc, A. B. Pashkovskiid

a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk, Russia
b Novosibirsk State Technical University, Novosibirsk, Russia
c Scientific and Research Institute of Semiconductors, Tomsk, Russia
d Research and Production Corporation "Istok" named after Shokin, Fryazino, Moscow oblast, Russia

Abstract: The pHEMT heterostructures optimized in this work to improve the parameters of switching microwave transistors have a one-sided $\delta$-doping at 6 $\cdot$ 10$^{12}$ cm$^{-2}$ and an AlAs/GaAs spacer. Such heterostructures were used to fabricate the monolithic integrated circuits of single-pole double throw pHEMT switches with gate length and width of 0.5 $\mu$m and 100 $\mu$m, respectively. The resulting transistors had the following parameters: $g_{\mathrm{max}}$ = 400 mS/mm, saturation current $I_D$ = 380 mA/mm, ON-state resistance 1.0 $\Omega$ $\cdot$ mm, OFF-state capacitance 0.37 pF/mm. The switch parameters at 20 GHz are: insertion loss -2.2 dB, isolation -56 dB, return loss -11.7 dB, linearity $P_{1\mathrm{dB}}$ = 21 dBm and II$P_3$ = 40 dBm.

Keywords: single-side doping, spacer design, maximal conductivity, pHEMT, switches.

Received: 26.05.2022
Revised: 14.07.2022
Accepted: 16.07.2022

DOI: 10.21883/PJTF.2022.17.53282.19260



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