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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2025 Volume 51, Issue 4, Pages 11–14 (Mi pjtf7489)

the features of the crystallization of an intermediate silicon layer during the transfer of a thin 3C-SiC(001) layer onto a 6H-SiC(0001) substrate

A. V. Myasoedov, M. G. Mynbaeva, S. P. Lebedev, S. Yu. Priobrazhenskii, D. G. Amelchuk, A. A. Lebedev

Ioffe Institute, St. Petersburg, Russia

Abstract: The paper considers the features of crystallization of the silicon bonding layer between a (001)-oriented thin layer of cubic silicon carbide and a hexagonal (0001) 6H-SiC substrate. General patterns revealed in the formation of orientation relationships for the silicon layer with respect to the 3C-SiC layer and the 6H-SiC substrate are discussed.

Keywords: silicon carbide, silicon, TEM.

Received: 04.10.2024
Revised: 04.10.2024
Accepted: 14.10.2024

DOI: 10.61011/PJTF.2025.04.59835.20138



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© Steklov Math. Inst. of RAS, 2025