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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015 Volume 41, Issue 6, Pages 73–80 (Mi pjtf7666)

This article is cited in 3 papers

Dielectric properties of laser-ablated HfO$_2$ particles

M. A. Pugachevskiiab, V. I. Panfilovb

a Institute for Material Studies, Khabarovsk Division, Far-Eastern Branch of the Russian Academy of Sciences, Khabarovsk
b Far Eastern State Transport University

Abstract: Dielectric properties of hafnium dioxide (HfO$_2$) nanoparticles obtained by pulsed laser ablation have been studied by impedance spectroscopy in a frequency range from 50 to 10$^5$ Hz. It is established that the dielectric permittivity of obtained particles depends on the degree of porosity of the ablated material, As the porosity decreases, both real $(\varepsilon')$ and imaginary $(\varepsilon'')$ components of the complex dielectric permittivity tend to increase. According to analysis in the framework of the Bruggeman effective medium approximation, the static dielectric permittivity of obtained HfO$_2$ nanoparticles amounts to $\varepsilon'$ = 24 $\pm$ 2.

Received: 07.07.2014


 English version:
Technical Physics Letters, 2015, 41:3, 291–293

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