Abstract:
The structure of zinc oxide (ZnO) films deposited on silicon substrates using dc glow discharge in oxygen have been studied for two electrode configurations—with tubular (hollow) and planar cathodes. At a substrate temperature of 670 K and oxygen pressure of 0.5 Torr, ZnO films synthesized in the hollow cathode geometry possess a columnar structure, while those obtained in the planar geometry are continuous. A decrease in the oxygen pressure from 0.5 to 0.2 Torr in discharge with the hollow cathode geometry leads to a change from a columnar to continuous film structure, while the morphology of films obtained in the planar geometry remains unchanged. The synthesized films exhibit a high degree of crystallographic orientation [001]$_{\mathrm{ZnO}}$ || [001]$_{\mathrm{Si}}$ with complete azimuthal disorientation in the plane of film conjugation with the substrate.