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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2013 Volume 39, Issue 15, Pages 40–46 (Mi pjtf8561)

This article is cited in 11 papers

Charge distribution of ions in low-current vacuum-arc plasma

G. A. Mesyatsab, E. M. Oksab

a P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow
b Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, Tomsk

Abstract: The charge distribution of vacuum-arc ions has been investigated for the arc between copper electrodes at currents varied from 8 to 60 A (with the arc voltage increased from 21 to 24 V). Plasma contains copper ions with charge states from +1 to +4. The mean ion charge state increases from 2.15 to 2.24 (i.e., by only 4%) due to a small increase in the fractions of multiply charged ions (Cu$^{2+}$ and Cu$^{3+}$) in the total ion flux. This conclusion does not contradict that of the ecton model of vacuum-arc cathode spot, according to which the number of cells in the spot that are due to microexplosions on the cathode increases proportionally to the arc current.

Received: 28.03.2013


 English version:
Technical Physics Letters, 2013, 39:8, 687–689

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